服部賢 准教授 (物性情報物理学研究室)
Creation of three-dimensional shaped micro-scale Si structures with atomically flat surfaces toward functional property
So far, atomically controlled thin films have been fabricated on two-dimensional (2D) shaped planes and applied for semiconducting devices. Recently, the construction of films on three-dimensional (3D) shaped materials has been required to realize highly density devices.
However, fundamental surface science has still focused on properties of materials fabricated on 2D planes, but not on 3D. In these years, our group successfully create micro-scale Si structures with atomically flat surfaces, which are the platform of the construction of functional films. In the presentation, I will introduce our recent activities.